The analysis of crystalline interfaces, such as thin films and grain boundaries, is crucial for the design, development, and application of various modern materials. During the epitaxial growth of thin films and the self-assembly of crystalline nanostructures, multi-scale phenomena take place and the microscopic morphology strongly impacts the material macroscopic properties. Any progress in the modeling of interface-pattern formations carries the potential for a significant technological impact.
The workshop aims at presenting the state of the art and the most recent advancements in the derivation, validation, and implementation of reliable models for the characterization of interface crystalline morphologies. New results will be presented both at the analytical and at the experimental level. On the one hand interface morphologies will be analytically characterized as minimizers of configurational energies in the framework of the Calculus of Variations or as solutions of evolutionary PDEs. On the other hand solutions and challenges encountered in experiments when growing supported nanostructures for example by Molecular Beam Epitaxy (MBE) and Pulsed Laser Deposition (PLD) will be presented. Topics that will be addressed include:
In case of interest in participating, please register by sending an email to email@example.com specifying name, affiliation, and mail address (by October 28th).
The workshop is hosted and supported by the Erwin Schrödinger International Institute for Mathematics and Physics (ESI), a programme-oriented research institute for mathematics and physics at the University of Vienna. Partial support is acknowledged from WWTF through MoDeNa project (grant MA16-005) and from FWF through OSCI project (grant P29681).